Analysis and simulation of Au/InSb/InP diode C-V characteristic:: modeling and experiments

被引:33
|
作者
Akkal, B [1 ]
Benamara, Z
Gruzza, B
Bideux, L
Bouiadjra, NB
机构
[1] Univ Blaise Pascal Clermont 2, Lab Sci Mat Elect & Automat, F-63177 Aubiere, France
[2] Univ Djillali Sidi Bel Abbes, Lab Microelect Appl, Sidi Bel Abbes 22000, Algeria
关键词
energy density distribution; relaxation time; Au/InSb/InP(100) Schottky diodes;
D O I
10.1016/S0928-4931(02)00083-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of the energy density distribution and relaxation time of the interface state on electric parameters of Au/InSb/InP(100) Schottky diodes were investigated, in the latter diode, InSb forms a fine restructuration layer allowing to block P atoms migration to surface. To be sure of the disappearance of the In droplets, a high quantity of Sb was evaporated and the excess was eliminated by heating the substrate surface at 300 degreesC before evaporating An onto it. The current-voltage I(V-G) and capacitance-voltage C(V-G) characteristics are measured as a function of frequency (100 Hz-1 MHz). Typical Ln[I/(1 - e(-qVG/kT))] versus V-G characteristics of Au/heated InSb/InP(100) Schottky diode under forward bias show two linear regions separated by a transition segment. From the first region, the slope and the intercept of this plot on the current axis allow to determine the ideality factor n and the saturation current I-s evaluated to 1.79 and 1.64 x 10(-7) A, respectively. The mean density of interface states estimated from the C(V-G) measurements was 1.57 10(12) cm(-2) eV(-1). The interface states were responsible for the non-ideal behavior of the I(V-G) characteristics, the capture cross-section sigma(n) for the fast slow varies between 2.16 x 10(-11) and 7.13 x 10(-12) cm(2) for the relaxation times range 7.9 x 10(-3)-2.4 x 10(-2)s. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:291 / 296
页数:6
相关论文
共 50 条
  • [1] Illumination dependence of I-V and C-V characterization of Au/InSb/InP(100) Schottky structure
    Akkal, B.
    Benamara, Z.
    Bouiadjra, N. Bachir
    Tizi, S.
    Gruzza, B.
    APPLIED SURFACE SCIENCE, 2006, 253 (03) : 1065 - 1070
  • [2] A Study of the Terahertz C-V Characteristic of the Schottky Barrier Diode
    Ren, Tianhao
    Zhang, Yong
    2017 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM (IMS), 2017, : 2003 - 2006
  • [3] Analysis of C-V Characteristics of InP(p)/InSb/Al2O3/Au MIS Structures in Wide Temperature Range
    Benamara, M. A.
    Talbi, A.
    Benamara, Z.
    Akkal, B.
    Sari, N. Chabane
    Gruzza, B.
    Robert, C.
    ADVANCED MATERIALS RESEARCH III, 2013, 685 : 179 - +
  • [4] Dynamic C-V characteristic for simulation of crosstalk caused by a varactor load
    Watanabe, Takemi
    Sangkrasin, Apiruk
    Matsumoto, Fujihiko
    Noguchi, Yasuaki
    2006 INTERNATIONAL SYMPOSIUM ON INTELLIGENT SIGNAL PROCESSING AND COMMUNICATIONS, VOLS 1 AND 2, 2006, : 517 - +
  • [6] C-V ANALYSIS OF ELECTRICAL-PROPERTIES FOR PN HETEROINTERFACE IN INP/INGAASP DOUBLE-HETEROJUNCTION LASER DIODE
    YAMAMOTO, N
    YOKOYAMA, K
    YAMAMOTO, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (10A): : L1722 - L1725
  • [7] Study of lateral polysilicon PN diodes C-V characteristics: Modeling and experiments
    Amrani, M
    Sehil, H
    Menezla, R
    Benamara, Z
    Raoult, F
    SOLID-STATE ELECTRONICS, 1998, 42 (11) : 1925 - 1931
  • [8] Simulation and modeling of C-V curves of OLEDs with trap states for the holes
    Paasch, G
    Scheinert, S
    SYNTHETIC METALS, 2001, 122 (01) : 145 - 147
  • [9] Physics based model for C-V characteristic of integrated planar Schottky varactor diode in microwave band
    Tian, T
    Luo, JS
    Li, ZH
    Chen, TS
    Lin, JT
    1997 ASIA-PACIFIC MICROWAVE CONFERENCE PROCEEDINGS, VOLS I-III, 1997, : 557 - 559
  • [10] Analysis of the C-V characteristic in SiO2/GaN MOS capacitors
    Cortes, I.
    Al-Alam, E.
    Besland, M. P.
    Regreny, P.
    Morancho, F.
    Cazarre, A.
    Cordier, Y.
    Goullet, A.
    Isoird, K.
    PROCEEDINGS OF THE 2009 SPANISH CONFERENCE ON ELECTRON DEVICES, 2009, : 254 - +