Effect of dimethylamine borane concentration on antireflection properties of silica thin films via redox deposition

被引：13

作者：

Chigane, Masaya ^{[1
]}

Izaki, Masanobu ^{[1
]}

Hatanaka, Yoshiro ^{[1
]}

Shinagawa, Tsutomu ^{[1
]}

Ishikawa, Masami ^{[1
]}

机构：

[1] Osaka Municipal Tech Res Inst, Dept Elect Mat, Joto Ku, Osaka 5368553, Japan

来源：

THIN SOLID FILMS | 2006年 / 515卷 / 04期

关键词：

antireflection coating; poly(ethylene terephthalate); dimethylamine borane; silicon dioxide; polymer substrate; atomic force microscopy; optical properties; transmission electron microscopy;

D O I：

10.1016/j.tsf.2006.07.166

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Silica thin films were deposited by the redox reaction of an aqueous ammonium hexafluorosilicate solution with reducing agent: dimethylamine borane (DMAB) onto poly(ethylene terephthalate) (PET) substrate. The antireflection and transparent-enhancement effect of the films to PET substrate were investigated varying initial concentrations of DMAB. The surface and inner phase morphology of the silica films were characterized by means of atomic force microscopy and transmission electron microscopy. A model for the manner of the silica film growth according to aggregation of spherical granular of which the radius sizes are changed by DMAB concentration was proposed. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：2513 / 2518

页数：6

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