Stress mapping of chemical-vapor-deposited diamond film surface by micro-Raman spectroscopy

A confocal Raman spectroscopy was used to measure intrinsic stress distribution on the growth surface within individual grains of chemical-vapor-deposited diamond film. Polarization analysis of the Raman line shape revealed that even in high quality (2.8 cm(-1) linewidth), free-standing film of 0.6 mm thickness, small regions exist where high local stresses (both compressive and tensile) develop. The stressed regions tend to appear near crystal edges and grain boundaries. A strong gradient in defect or impurity concentrations is supposed to cause the stress fluctuations observed. (C) 1997 American Institute of Physics.