Cu underpotential deposition on Au(111) and Au(100).: Can this be explained in terms of the energetics of the Cu/Au system?

被引：27
|
作者：
Sánchez, C [1 ]
Leiva, EPM [1 ]
机构：
[1] Univ Nacl Cordoba, Fac Ciencias Quim, Unidad Matemat & Fis, RA-5000 Cordoba, Argentina
来源：
ELECTROCHIMICA ACTA | 1999年 / 45卷 / 4-5期
关键词：
underpotential deposition; density functional calculations; work function;
D O I：
10.1016/S0013-4686(99)00248-0
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
In this work we undertake a first principles study of the deposition of Copper on Au(111) and Au(100) surfaces from a density functional point of view: The analysis of the different energetic contributions to the so-called underpotential shift indicates that the deposition of Cu on any of these surfaces should occur at overpotentials. We conclude that some other factors must be taken into account to explain the experimental results, such as anion coadsorption. We also analyze the work function and the electronic density in the system. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：691 / 697
页数：7
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