Effect of arc current on the properties of TiN films deposited by multi-arc ion plating

TiN thin films are deposited on the substrates of HSS and stainless steel at different arc current, using a type of multi-arc ion plating system of AIP-01. The effect of the arc current on the properties of TiN thin films were studied by testing its hardness, coefficient and analyzing its SEM images and structures. The results show that the substrate temperature can be raised by large arc current, with the temperature increasing, and the film structure will change from a coarse domed microstructure to a dense columnar structure, so the hardness of the film is enhanced, but with the arc current increasing,the microdroplets become more and larger on the surface of the films, which make the surface coarser and the coefficient higher. These lead to the films have poor corrosion resistance. So to control optimum arc current to gain best properties of TiN films is one of the key problems in ion plated TiN films.