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Electrodeposition of thin sulfide films:: nucleation and growth observed for Bi2S3
被引:30
|作者:
Grubac, Z
Metikos-Hukovic, M
机构:
[1] Univ Zagreb, Fac Chem Engn & Technol, Dept Electrochem, Zagreb 10000, Croatia
[2] Univ Split, Fac Chem Technol, Dept Gen & Inorgan Chem, Split 21000, Croatia
关键词:
nucleation;
bismuth;
sulfide films;
chronoamperometry;
D O I:
10.1016/S0040-6090(02)00350-4
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The potentiostatic pulse technique proved to be the most powerful electrochemical technique for in situ studies of the early stages of Bi2S3 electrodeposition on bismuth. The current-time response recorded at the overpotentials in the vicinity of E-r (Bi2S3/Bi) in dependence of hydrogen sulfide ion concentrations, was described by a theoretical expression for three-dimensional progressive nucleation and growth under diffusion control. Through the application of relations which hold true for such a nucleation model, the following parameters were determined: (i) the anodic nucleation potential (E-AN); (ii) the rate of nucleation (AN(infinity)); (iii) the diffusion coefficient (D); and (iv) the density of the growing sites (N-s). (C) 2002 Elsevier Science B.V. All rights reserved.
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页码:248 / 256
页数:9
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