10-kV 123-mΩ.cm2 4h-sic Power DMOSFETS

被引:123
|
作者
Ryu, SH [1 ]
Krishnaswami, S
O'Loughlin, M
Richmond, J
Agarwal, A
Palmour, J
Hefner, AR
机构
[1] Cree Inc, Durham, NC 27703 USA
[2] NIST, Gaithersburg, MD 20899 USA
关键词
4H-SiC; power MOSFET; high voltage; high-speed switching;
D O I
10.1109/LED.2004.832122
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
10 kV, 123 mOmega(.)cm(2) Power DMOSFETs in 4H-SiC are demonstrated. A 42% reduction in R-on,R-sp, compared to a previously reported value, was achieved by using an 8 x 10(14) cm(-3) doped, 85-mum-thick drift epilayer. An effective channel mobility of 22 cm(2)/Vs was measured from a test MOSFET. A specific on-resistance of 123 mOmega(.)cm(2) were measured with a gate bias of 18 V, which corresponds to an E-ox of 3 MV/cm. A leakage current of 197 muA was measured at a drain bias of 10 kV from a 4H-SiC DMOSFET with an active area of 4.24 x 10(-3) cm(2). A switching time of 100 ns was measured in 4.6-kV, 1.3-A switching measurements. This shows that the 4H-SiC power DMOSFETS are ideal for high-voltage, high-speed switching applications.
引用
收藏
页码:556 / 558
页数:3
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