Dynamics of Si-H vibrations in an amorphous environment

被引:35
|
作者
van der Voort, M
Rella, CW
van der Meer, LFG
Akimov, AV
Dijkhuis, JI
机构
[1] Univ Utrecht, Fac Phys & Astron, Debye Inst, NL-3508 TA Utrecht, Netherlands
[2] FOM, Inst Atom & Mol Phys, NL-1098 SJ Amsterdam, Netherlands
[3] FOM, Inst Plasma Phys, NL-3430 BE Nieuwegein, Netherlands
[4] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
关键词
D O I
10.1103/PhysRevLett.84.1236
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present results of the first Vibrational photon-echo, transient-grating, and temperature dependent transient- bleaching experiments on a-Si:H. Using these techniques, and the infrared Light of a free electron laser, the vibrational population decay and phase relaxation of the Si-H stretching mode were investigated. Careful analysis of the data indicates that the vibrational energy relaxes directly into SI-H bending modes and Si phonons, with a distribution of rates determined by the amorphous host. Conversely, the pure dephasing appears to be single exponential, and can be modeled by dephasing via two-phonon interactions.
引用
收藏
页码:1236 / 1239
页数:4
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