共 50 条
- [4] Evaluation of new megasonic system for single wafer-cleaning [J]. CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING VII, PROCEEDINGS, 2002, 2002 (26): : 15 - 22
- [6] Using surface charge analysis to characterize silicon wafer-cleaning processes [J]. Microcontamination, 1990, 8 (10):
- [9] Batch wet process still dominates wafer-cleaning market - But for how long? [J]. MICRO, 2004, 22 (03): : 58 - +
- [10] Emerging markets and emerging technologies [J]. HDP'07: PROCEEDINGS OF THE 2007 INTERNATIONAL SYMPOSIUM ON HIGH DENSITY PACKAGING AND MICROSYSTEM INTEGRATION, 2007, : 185 - +