Tuning the Electrical Properties of Si Nanowire Field-Effect Transistors by Molecular Engineering
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作者:
Bashouti, Muhammad Y.
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Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, IsraelCUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Bashouti, Muhammad Y.
[2
,3
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Tung, Raymond T.
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CUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USACUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Tung, Raymond T.
[1
]
Haick, Hossam
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Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, IsraelCUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Haick, Hossam
[2
,3
]
机构:
[1] CUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
[2] Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
[3] Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, Israel
Exposed facets of n-type silicon nanowires (Si NWs) fabricated by a top-down approach are successfully terminated with different organic funcitonalities, including 1,3-dioxan,2,ethyl, butyl, allyl, and propyl-alcohol, using a two-step chlorination/alkylation method. X-ray photoemission spectroscopy and spectroscopic ellipsometry establish the bonding and the coverage of these molecular layers. Field-effect transistors fabricated from these Si NWs displayed characteristics that depended critically on the type of molecular termination. Without molecules the source-drain conduction is unable to be turned off by negative gate voltages as large as -20 V. Upon adsorption of organic molecules there is an observed increase in the "on" current at large positive gate voltages and also a reduction, by several orders of magnitude, of the "off" current at large negative gate voltages. The zero-gate voltage transconductance of molecule-terminated Si NW correlates with the type of organic molecule. Adsorption of butyl and 1,3-dioxan-2-ethyl molecules improves the channel conductance over that of the original SiO2-Si NW, while adsorption of molecules with propyl-alcohol leads to a reduction. It is shown that a simple assumption based on the possible creation of surface states alongside that attachment of molecules may lead to a qualitative explanation of these electrical characteristics. The possibility and potential implications of modifying semiconductor devices by tuning the distribution of surface states via the funtionality of attached molecules are discussed.
机构:
Yonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Moon, Kyeong-Ju
Choi, Ji-Hyuk
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Yonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Choi, Ji-Hyuk
Lee, Tae-Il
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Yonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Lee, Tae-Il
Ham, Moon-Ho
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Yonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Ham, Moon-Ho
Maeng, Wan-Joo
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Yonsei Univ, Nanodevice Lab, Dept Elect & Elect Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Maeng, Wan-Joo
Hwang, Inchan
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Yonsei Univ, Nanodevice Lab, Dept Elect & Elect Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Hwang, Inchan
Kim, Hyungjun
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Yonsei Univ, Nanodevice Lab, Dept Elect & Elect Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
Kim, Hyungjun
Myoung, Jae-Min
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Yonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Informat & Elect Mat Res Lab, Dept Mat Sci & Engn, Seoul 120749, South Korea
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Yonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South Korea
Kim, Do Hoon
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Lee, Su Jeong
Lee, Sang Hoon
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Yonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South Korea
Lee, Sang Hoon
Myoung, Jae-Min
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Yonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South Korea
机构:
Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Sato, Soshi
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Kakushima, Kuniyuki
Ohmori, Kenji
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Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058573, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Ohmori, Kenji
Natori, Kenji
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Natori, Kenji
Yamada, Keisaku
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Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058573, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Yamada, Keisaku
Iwai, Hiroshi
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
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UJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
UJF Grenoble 1, INAC, SiNaPS Lab SP2M, UMR E CEA, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Rosaz, G.
Salem, B.
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UJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Salem, B.
Pauc, N.
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UJF Grenoble 1, INAC, SiNaPS Lab SP2M, UMR E CEA, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Pauc, N.
Gentile, P.
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UJF Grenoble 1, INAC, SiNaPS Lab SP2M, UMR E CEA, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Gentile, P.
Potie, A.
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UJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Potie, A.
Solanki, A.
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UJF Grenoble 1, INAC, SiNaPS Lab SP2M, UMR E CEA, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Solanki, A.
Bassani, F.
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UJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Bassani, F.
Baron, T.
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UJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France
Baron, T.
Cagnon, L.
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UJF Grenoble 1, CNRS, Inst Neel, F-38042 Grenoble 9, FranceUJF Grenoble, CEA Grenoble, UMR CNRS 5129, LTM, 17 Rue Martyrs, F-38054 Grenoble, France