Textured diamond growth by low pressure flat flame chemical vapor deposition

被引：19
|
作者：
Wolden, CA [1 ]
Sitar, Z [1 ]
Davis, RF [1 ]
Prater, JT [1 ]
机构：
[1] USA,RES OFF,RES TRIANGLE PK,NC 27709
来源：
APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 15期
关键词：
D O I：
10.1063/1.117146
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A laminar, flat-flame burner has been constructed for the deposition of diamond films using an acetylene/oxygen flame at reduced pressures. The stagnation flow results in uniform deposition conditions across the diameter of the burner. Under certain operating conditions the growth rate and morphology are primarily controlled by the substrate temperature. Conditions for the deposition of [100] textured films are reported for a flat-flame system. From growth rate measurements an apparent activation energy of 22 kcal/mol was observed. The maximum growth rate of 5.5 mu m/h is the highest reported to date for a low pressure combustion system. (C) 1996 American Institute of Physics.
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收藏
页码：2258 / 2260
页数：3
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