Discharge current modes of high power impulse magnetron sputtering

被引：15

作者：

Wu, Zhongzhen ^{[1
]}

Xiao, Shu ^{[1
]}

Ma, Zhengyong ^{[1
]}

Cui, Suihan ^{[1
]}

Ji, Shunping ^{[1
]}

Tian, Xiubo ^{[2
]}

Fu, Ricky K. Y. ^{[3
]}

Chu, Paul K. ^{[3
]}

Pan, Feng ^{[1
]}

机构：

[1] Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China

[2] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China

[3] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China

来源：

AIP ADVANCES | 2015年 / 5卷 / 09期

关键词：

THIN-FILMS; SURFACES; HIPIMS; DC;

D O I：

10.1063/1.4932135

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated. (C) 2015 Author(s).

引用

页数：8

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