Fabrication of silicon slot waveguides with 10nm wide oxide slot

被引：0
|
作者：
Debnath, Kapil [1 ]
Khokhar, Ali Z. [2 ]
Reed, Graham T. [2 ]
Saito, Shinichi [1 ]
机构：
[1] Univ Southampton, Fac Phys Sci & Engn, Southampton SO17 1BJ, Hants, England
[2] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England
来源：
2017 IEEE 14TH INTERNATIONAL CONFERENCE ON GROUP IV PHOTONICS (GFP) | 2017年
基金：
英国工程与自然科学研究理事会;
关键词：
Silicon photonics; slot waveguide; accumulation type modualtor; light source;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We propose and demonstrate a fabrication technique to realize extremely narrow dielectric slots in silicon waveguides. Using this method, we have demonstrated a silicon slot waveguide with 10 nm dielectric slot with a measured propagation loss of 13.6 dB/cm.
引用
收藏
页码：37 / 38
页数：2
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