Measurement of large low-order aberrations by using a series of through-focus Ronchigrams

被引:1
|
作者
Akima, Hisanao [1 ,2 ]
Yoshida, Takaho [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
[2] Tohoku Univ, Res Inst Elect Commun, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
STEM; aberration measurement; Ronchigram; line-focus; autocorrelation; auto-tuning; CONTRAST TRANSFER-FUNCTION; AUTOCORRELATION FUNCTION; ELECTRON-MICROSCOPE; STEM;
D O I
10.1093/jmicro/dfu010
中图分类号
TH742 [显微镜];
学科分类号
摘要
A method for measuring large aberrations up to second order (defocus, 2-fold astigmatism and axial coma), which uses a through-focus series of Ronchigrams, is proposed. The method is based on the principle that line-focus conditions in Ronchigrams can be locally detected and low-order aberrations can thereby be measured. The proposed method provides auto-tuning of large low-order aberration; in particular, iterative aberration measurement and correction reduce low-order aberrations from several thousand nanometers to less than a few hundred nanometers, which can be handled by conventional fine-aberration tuning methods.
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页码:325 / 332
页数:8
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