Nanoscale patterning of self-assembled monolayers using DNA nanostructure templates

被引:21
|
作者
Surwade, S. P. [1 ]
Zhou, F. [1 ]
Li, Z. [1 ]
Powell, A. [1 ]
O'Donnell, C. [1 ]
Liu, H. [1 ]
机构
[1] Univ Pittsburgh, Dept Chem, 219 Parkman Ave, Pittsburgh, PA 15260 USA
基金
美国国家科学基金会;
关键词
MOLECULAR LITHOGRAPHY; WETTING PROPERTIES; SURFACES; GOLD; GRAPHENE; SHAPES; BINDING; SINGLE; GROWTH; ARRAYS;
D O I
10.1039/c5cc08183a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We describe a method to pattern arbitrary-shaped silane self-assembled monolayers (SAMs) with nm scale resolution using DNA nanostructures as templates. The DNA nanostructures assembled on a silicon substrate act as a soft-mask to negatively pattern SAMs. Mixed SAMs can be prepared by back filling the negative tone patterns with a different silane.
引用
收藏
页码:1677 / 1680
页数:4
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