Preparation of silicon-substituted hydroxyapatite coatings on Ti-30Nb-xTa alloys using cyclic electrochemical deposition method

被引:11
|
作者
Kim, Eun-Sil [1 ]
Jeong, Yong-Hoon [2 ]
Choe, Han-Cheol [1 ]
Brantley, William A. [3 ]
机构
[1] Chosun Univ, Sch Dent, Dept Dent Mat, Res Ctr Nanointerface Activat Biomat, Kwangju, South Korea
[2] Ohio State Univ, Coll Dent, Div Orthodont, Biomech & Tissue Engn Lab, Columbus, OH 43210 USA
[3] Ohio State Univ, Coll Dent, Div Restorat Sci & Prosthodont, Columbus, OH 43210 USA
关键词
Ti-30Nb-xTa alloy; Si-HA coating; Electrochemical deposition; Surface characteristics; Wettability; TA-ZR ALLOYS; TI-NB-TA; BIOMEDICAL APPLICATIONS; TITANIUM SUBSTRATE; BIOMIMETIC PROCESS; ELECTRON-MICROSCOPY; SURFACE; FILM; PRECIPITATION; MICROSTRUCTURE;
D O I
10.1016/j.tsf.2014.09.020
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon-substituted hydroxyapatite coatings on Ti-30Nb-xTa alloys, prepared using a cyclic electrochemical deposition method, have been investigated using a variety of surface analytical experimental methods. The silicon-substituted hydroxyapatite (Si-HA) coatings were prepared by electrolytic deposition in electrolytes containing Ca2+, PO43- and SiO32- ions. The deposited layers were characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), field emission scanning electron microscopy (FE-SEM), energy-dispersive X-ray spectroscopy (EDS), and a wettability test. Phase transformation from (alpha '' + beta) to largely beta occurred with increasing Ta content in the Ti-30Nb-xTa alloys, yielding larger grain size. The morphology of the Si-HA coatings was changed by increasing the number of deposition cycles, with the initial plate-like structures changing to mixed rod-like and plate-like shapes, and finally to a rod-like structure. From the ATR-FTIR spectra, Si existed in the form of SiO44- groups in Si-HA coating layer. The lowest aqueous contact angles and best wettability were found for the Si-HA coatings prepared with 30 deposition cycles. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:99 / 104
页数:6
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