Index of refraction of high-index lithographic immersion fluids and its variability

被引:9
|
作者
Yang, Min K. [1 ]
Kaplan, Simon G. [2 ]
French, Roger H. [1 ]
Burnett, John H. [2 ]
机构
[1] DuPont Co Inc, Cent Res & Dev, Expt Stn, Wilmington, DE 19880 USA
[2] NIST, Phys Lab, Gaithersburg, MD 20899 USA
来源
关键词
lithography; index; temperature coefficient of the refractive index;
D O I
10.1117/1.3124189
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have developed a number of second-generation high-index candidate immersion fluids that exceed the 1.6 refractive index requirement for immersion lithography at 193 nm to replace the water used in first-generation immersion systems. To understand the behavior and performance of different fluid classes, we use spectral index measurements, based on the prism minimum deviation method, to characterize the index dispersion. In addition to fluid absorbance and index requirements, the temperature coefficient of the refractive index is a key parameter. We have used a laser-based Hilger-Chance refractometer system to determine the thermo-optic coefficient (dn/dT) by measuring the index change versus temperature at two different laser wavelengths, 632.8 and 193.4 nm. Also, we determined the batch-to-batch (within a 6-month period), before and after irradiation (at 193.4 nm), before and after air exposure, and before and after resist exposure (image printing test) variations of index and Delta n/Delta lambda. The optical properties of these second-generation immersion fluids mostly compare favorably to water; the ratio of index of refraction at 193.4 nm is 1.644/1.437, the dispersion from d-line (Delta n(193-d)) is 0.160 versus 0.103 and dn/dT at 193.4 is -550 x 10(-6)/K vs. -93 x 10(-6)/K, respectively. (c) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3124189]
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页数:6
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