Atomic processes in self-diffusion of Ni surfaces

被引：31
|
作者：
Fu, TY [1 ]
Tsong, TT
机构：
[1] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
[2] Natl Taiwan Normal Univ, Dept Phys, Taipei, Taiwan
来源：
SURFACE SCIENCE | 2000年 / 454卷 / 01期
关键词：
adatoms; field ion microscopy; nickel; surface diffusion;
D O I：
10.1016/S0039-6028(00)00095-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22+/-0.02 eV and 0.59 +/- 0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84+/-0.19 eV for the 'ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange. (C) 2000 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码：571 / 574
页数：4
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