Introducing defects in 3D photonic crystals:: State of the art

被引:214
|
作者
Braun, Paul V.
Rinne, Stephanie A.
Garcia-Santamaria, Florencio
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
关键词
D O I
10.1002/adma.200600769
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
3D photonic crystals (PhCs) and photonic bandgap (PBG) materials have attracted considerable scientific and technological interest. In order to provide functionality to PhCs, the introduction of controlled defects is necessary, the importance of defects in PhCs is comparable to that of dopants in semiconductors. Over the past few years, significant advances have been achieved through a diverse set of fabrication techniques. While for some routes to 3D PhCs, such as conventional lithography, the incorporation of defects is relatively straightforward; other methods, for example, self-assembly of colloidal crystals (CCs) or holography, require new external methods for defect incorporation. In this review, we will cover the state of the art in the design and fabrication of defects within 3D PhCs. The figure displays a fluorescence laser scanning confocal microscopy image of a y-splitter defect formed through two-photon polymerization within a CC.
引用
收藏
页码:2665 / 2678
页数:14
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