Patterning magnetic films by ion beam irradiation

被引：77
|
作者：
Terris, BD
Weller, D
Folks, L
Baglin, JEE
Kellock, AJ
Rothuizen, H
Vettiger, P
机构：
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[2] IBM Corp, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland
来源：
JOURNAL OF APPLIED PHYSICS | 2000年 / 87卷 / 09期
关键词：
D O I：
10.1063/1.372912
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have used ion beam irradiation through a silicon stencil mask to alter the magnetic properties of Co/Pt multilayer and FePt chemically-ordered superlattice films. In both systems, ion irradiation disorders the as-grown films which results in a reduction of the magnetic anisotropy. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter. These magnetic structures have been observed by magnetic force microscopy. By stepping the mask during irradiation, features at twice the spatial frequency of the mask holes have been produced. Such patterned magnetic films are of interest for application in high-density magnetic recording. (C) 2000 American Institute of Physics. [S0021- 8979(00)84908-7].
引用
收藏
页码：7004 / 7006
页数：3
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