Suppression of Current Collapse in Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors

被引:17
|
作者
Wang, Chih-Hao [1 ]
Ho, Shin-Yi [1 ]
Huang, Jian Jang [2 ]
机构
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Inst Photon & Optoelect, Dept Elect Engn, Taipei 10617, Taiwan
关键词
HEMT; enhancement mode; current collapse; SURFACE-STATES; GATE METAL; HEMTS; IMPACT; PERFORMANCE;
D O I
10.1109/LED.2015.2498623
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The phenomenon of current collapse was investigated on p-GaN/AlGaN/GaN enhancement-mode high electron mobility transistors. Contrary to our original thought of carrier depletion on the p-GaN/AlGaN/GaN layers so that less carrier traps, current collapse was observed from such a device without surface passivation. The results were compared with the device passivated with SiO2 dielectric, which showed much less severe current collapse within the gate bias of -15 V. To understand the mechanism of dielectric passivation, the capacitance-voltage measurement was performed. Our results show that the donor-like dislocations in the SiO2/GaN interface help to deplete carriers on the device surface and within the p-GaN, thus maintaining channel carriers and mitigating current collapse.
引用
收藏
页码:74 / 76
页数:3
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