Electrical instability of InGaZnO thin-film transistors with and without titanium sub-oxide layer under light illumination

被引:0
|
作者
Chiu, Y. C. [1 ]
Zheng, Z. W. [2 ]
Cheng, C. H. [3 ]
Chen, P. C. [4 ]
Yen, S. S. [1 ]
Fan, C. C. [1 ]
Hsu, H. H. [5 ]
Kao, H. L. [6 ]
Chang, C. Y. [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 30010, Taiwan
[2] Xiamen Univ, Dept Elect Engn, Xiamen 361005, Peoples R China
[3] Natl Taiwan Normal Univ, Dept Mechatron Engn, Taipei 10610, Taiwan
[4] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 30013, Taiwan
[5] Natl Taipei Univ Technol, Dept Mat & Mineral Resources Engn, Taipei 10608, Taiwan
[6] Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
来源
关键词
ZINC-OXIDE; MOBILITY; TEMPERATURE; MODEL; TFT;
D O I
10.1007/s00339-017-0831-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical instability behaviors of amorphous indium-gallium-zinc oxide thin-film transistors with and without titanium sub-oxide passivation layer were investigated under light illumination in this study. For the unpassivated IGZO TFT device, in contrast with the dark case, a noticeable increase of the sub-threshold swing was observed when under the illumination environment, which can be attributed to the generation of ionized oxygen vacancies within the alpha-IGZO active layer by high energy photons. For the passivated TFT device, the much smaller SS of similar to 70 mV/dec and high device mobility of >100 cm(2)/Vs at a drive voltage of 3 V with negligible degradation under light illumination are achieved due to the passivation effect of n-type titanium sub-oxide semiconductor, which may create potential application for high-performance display.
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页数:5
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