Correlation of biaxial strains, bound exciton energies, and defect microstructures in GaN films grown on AlN/6H-SiC(0001) substrates

被引:72
|
作者
Perry, WG [1 ]
Zheleva, T [1 ]
Bremser, MD [1 ]
Davis, RF [1 ]
Shan, W [1 ]
Song, JJ [1 ]
机构
[1] OKLAHOMA STATE UNIV,LASER RES CTR,STILLWATER,OK 74078
关键词
biaxial strain; donor bound excitons; gallium nitride (GaN); organometallic vapor phase epitaxy (OMVPE); photoluminescence (PL); Poisson's ratio; transmission electron microscopy (TEM); x-ray diffraction;
D O I
10.1007/s11664-997-0155-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Biaxial strains resulting from mismatches in thermal expansion coefficients and lattice parameters in 22 GaN films grown on AlN buffer layers previously deposited on vicinal and on-axis 6H-SiC(0001) substrates were measured via changes in the c-axis lattice parameter. A Poisson's ratio of v = 0.18 was calculated. The bound exciton energy (E(BX)) was a linear function of these strains. The shift in E(BX) with film stress was 23 meV/GPa. Threading dislocations densities of similar to 10(10)/cm(2) and similar to 10(8)/cm(2) were determined for GaN Rims grown on vicinal and on-axis SiC, respectively. A 0.9% residual compressive strain at the GaN/AlN interface was observed by high resolution transmission electron microscopy (HRTEM).
引用
收藏
页码:224 / 231
页数:8
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