0.018pm/°C Athermal Silicon Nitride Ring Resonator by Polymer Cladding

被引:0
|
作者
Yokoyama, S. [1 ]
Qiu, F. [1 ]
Feng, Y. [1 ]
Spring, A. M. [1 ]
Yamamoto, K. [1 ]
机构
[1] Kyushu Univ, Inst Mat Chem & Engn, Kasuga, Fukuoka 8168580, Japan
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report a simple and effective method for the postfunctionalization trimming of athermal silicon nitride ring resonators that overcomes the highly demanded fabrication. The silicon nitride ring resonator is covered by the Disperse Red 1 chromophore and poly(methyl methacrylate) (DR1/PMMA) top cladding. After a suitable bleaching of chromophore to manipulate the polymer's refractive index and thermo-optic coefficient, the ring resonator shows the reduction of the temperature-dependent wavelength shift from -9.8 to -0.018 pm/degrees C.
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