Deposition of diamond films on gradient cemented carbide

A new method was creatively proposed to deposit the diamond films on one kind of cobalt-deficient gradient cemented carbide by the microwave plasma chemical vapor deposition (MPCVD). The optimum technology conditions of depositing diamond coating were similar to those on the original cemented carbide. It was found that Co did not largely move to the surface as usual with deposition time increasing; moreover. The cobalt content in the surface of substrate after deposition decreased from about 3% to about 1%, which improved diamond coating's adhesion to the cemented carbide substrate.