Magnetization process in perpendicular epitaxial Cu/Ni/Cu/Si (001)

被引：0
|
作者：
Hug, H
Stiefel, B
Guntherodt, HJ
Bochi, G
Paul, DI
OHandley, RC
机构：
[1] UNIV BASEL,CH-4056 BASEL,SWITZERLAND
[2] MIT,CAMBRIDGE,MA 02139
来源：
JOURNAL OF APPLIED PHYSICS | 1997年 / 81卷 / 08期
关键词：
D O I：
10.1063/1.365060
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3896 / 3896
页数：1
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