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- [2] Mechanisms for CF2 radical generation and loss on surfaces in fluorocarbon plasmas JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (06): : 2661 - 2668
- [4] Surface productions of CF and CF2 radicals in high-density fluorocarbon plasmas JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2222 - 2226
- [5] Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: II. Production and loss of CF2 and CF in the processes of fluorocarbon polymerization Plasma Physics Reports, 2002, 28 : 243 - 257
- [7] Time resolved measurements of the CF2 rotational temperature in pulsed fluorocarbon rf plasmas PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (04): : 858 - 864
- [9] Behavior of F atoms and CF2 radicals in fluorocarbon plasmas for SiO2/Si etching JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (7B): : 4367 - 4372