Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

被引：25

作者：

Quesada-Gonzalez, Miguel ^{[1
,2
]}

Baba, Kamal ^{[1
]}

Sotelo-Vazquez, Carlos ^{[2
]}

Choquet, Patrick ^{[1
]}

Carmalt, Claire J. ^{[2
]}

Parkin, Ivan P. ^{[2
]}

Boscher, Nicolas D. ^{[1
]}

机构：

[1] Luxembourg Inst Sci & Technol, Dept Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

[2] UCL, Mat Chem Res Ctr, Dept Chem, 20 Gordon St, London WC1H 0AJ, England

来源：

JOURNAL OF MATERIALS CHEMISTRY A | 2017年 / 5卷 / 22期

关键词：

VISIBLE-LIGHT; PHOTOCATALYTIC ACTIVITY; TITANIUM-DIOXIDE; OXIDATION;

D O I：

10.1039/c7ta02029e

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.

引用

页码：10836 / 10842

页数：7

共 9 条

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Quesada-Gonzalez, Miguel
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ACS APPLIED MATERIALS & INTERFACES, 2016, 8 (38) : 25024 - 25029
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[8] The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating substitutional/interstitial N-doped anatase TiO2 thin-film; UVA and visible light photocatalytic activities
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