Tribological study of vanadium-based alloys ion implanted at low energy and high temperature

被引:8
|
作者
García, JA
Rodríguez, R
Sánchez, R
Martínez, R
Varela, M
Cáceres, D
Muñoz, A
Vergara, I
Ballesteros, C
机构
[1] Ctr Ingn Avanzada Superficies, AIN, Pamplona 31191, Spain
[2] Univ Carlos III Madrid, Dept Fis, Madrid 28911, Spain
关键词
ion implantation; vanadium alloy; hardness; tribology;
D O I
10.1016/S0042-207X(02)00246-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reports the improvements achieved in the tribological performance of V 5 at% Ti vanadium-based alloy ion implanted with nitrogen at low energy. Nitrogen ion implantation was carried out at 400degreesC with a current density of I mA/cm(2) and an accelerating voltage of 1.2 kV. Nanoindentation tests showed hardness increases by a factor close to 3. Ball-on-disk tests showed a decrease in friction coefficient. The thickness of the active implanted layer estimated from the nanoindentation tests is close to 500 run. A clear correlation between the improvement in the tribological properties: hardness, friction and wear and the implanted layer has been observed. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:543 / 550
页数:8
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