Observation of the Stacking Faults in In0.53Ga0.47As by Electron Channeling Contrast Imaging

被引:6
|
作者
Hsu, Po-Chun [1 ,2 ]
Han, Han [1 ]
Simoen, Eddy [1 ,3 ]
Merckling, Clement [1 ]
Eneman, Geert [1 ]
Mols, Yves [1 ]
Collaert, Nadine [1 ]
Heyns, Marc [1 ,2 ]
机构
[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
[2] Katholieke Univ Leuven, Dept Mat Engn, B-3001 Leuven, Belgium
[3] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium
关键词
atomic force microscopy; electron channeling contrast imaging; heteroepitaxy; InGaAs; misfit dislocations; stacking faults; DISLOCATION FORMATION; MICROSCOPY; MODELS; LAYERS;
D O I
10.1002/pssa.201900293
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The observation and interpretation of Frank stacking faults, Shockley stacking faults, Lomer dislocations, and 60 degrees misfit dislocations, which have similar line shapes in the (001) In0.53Ga0.47As crystalline surface, are performed with the electron channeling contrast imaging (ECCI) technique. To minimize the backscattered electron (BSE) contrast that resulted from the surface morphology, a relatively flat region is first selected and compared with an atomic force microscopy (AFM) image and then, subsequently, examining ECCI with transmission electron microscopy (TEM)-like invisibility criteria. By orthogonally choosing the diffraction vector g between (220) and (2-20), misfit dislocations seem to be always visible but partially faint in the g parallel to the line direction on the surface. With respect to the image contrast, Frank stacking faults and Lomer dislocations are likely to be completely invisible for parallel g. The criteria are further confirmed by cross-sectional TEM analysis, which shows a preferred homogeneous surface nucleation.
引用
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页数:6
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