Fabrication of Three-Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition

被引：86
|
作者：
Miyake, Masao [1 ]
Chen, Ying-Chieh [1 ]
Braun, Paul V. [1 ]
Wiltzius, Pierre [1 ]
机构：
[1] Univ Illinois, Dept Mat Sci & Engn, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA
来源：
ADVANCED MATERIALS | 2009年 / 21卷 / 29期
基金：
日本学术振兴会;
关键词：
SPONTANEOUS-EMISSION; BANDGAP MATERIALS; TEMPLATES; THICKNESS; SEMICONDUCTORS; INVERSION;
D O I：
10.1002/adma.200802085
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
High-quality 3D photonic crystals are fabricated through electrode position into a polymer template created by multibeam interference lithography. Complete infilling of the template is achieved through electrodeposition of Cu2O, and subsequent etching of the template results in a Cu2O/air photonic crystal with the exact inverse structure of the template (see figure). The resultant photonic crystal shows a high peak reflectance at the theoretically predicted wavelength.
引用
收藏
页码：3012 / +
页数：5
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