Pressure on charged domain walls and additional imprint mechanism in ferroelectrics

被引:44
|
作者
Mokry, P. [1 ]
Tagantsev, A. K.
Fousek, J.
机构
[1] Tech Univ Liberec, Dept Elect Engn, CZ-46117 Liberec, Czech Republic
[2] Swiss Fed Inst Technol, Ceram Lab, Dept Mat, EPFL, CH-1015 Lausanne, Switzerland
关键词
D O I
10.1103/PhysRevB.75.094110
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The impact of free charges on the local pressure on a charged ferroelectric domain wall produced by an electric field has been analyzed. A general formula for the local pressure on a charged domain wall is derived considering full or partial compensation of bound polarization charges by free charges. It is shown that the compensation can lead to a very strong reduction of the pressure imposed on the wall from the electric field. In some cases this pressure can be governed by small nonlinear effects. It is concluded that the free charge compensation of bound polarization charges can lead to substantial reduction of the domain wall mobility even in the case when the mobility of free charge carriers is high. This mobility reduction gives rise to an additional imprint mechanism which may play essential role in switching properties of ferroelectric materials. The effect of the pressure reduction on the compensated charged domain walls is illustrated for the case of 180 degrees ferroelectric domain walls and of 90 degrees ferroelectric domain walls with the head-to-head configuration of the spontaneous polarization vectors.
引用
下载
收藏
页数:6
相关论文
共 50 条
  • [1] Structure and Energy of Charged Domain Walls in Ferroelectrics
    Gureev, M. Y.
    Tagantsev, A. K.
    Setter, N.
    ISAF: 2009 18TH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, 2009, : 37 - 42
  • [2] Oxygen Vacancies Nucleate Charged Domain Walls in Ferroelectrics
    Petralanda, Urko
    Kruse, Mads
    Simons, Hugh
    Olsen, Thomas
    PHYSICAL REVIEW LETTERS, 2021, 127 (11)
  • [3] Rational Design of Molecular Ferroelectrics with Negatively Charged Domain Walls
    Xiong, Yu-An
    Gu, Zhu-Xiao
    Song, Xian-Jiang
    Yao, Jie
    Pan, Qiang
    Feng, Zi-Jie
    Du, Guo-Wei
    Ji, Hao-Ran
    Sha, Tai-Ting
    Xiong, Ren-Gen
    You, Yu-Meng
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2022, 144 (30) : 13806 - 13814
  • [4] Polarization Topology at the Nominally Charged Domain Walls in Uniaxial Ferroelectrics
    Tikhonov, Yurii
    Maguire, Jesi R.
    McCluskey, Conor J.
    McConville, James P., V
    Kumar, Amit
    Lu, Haidong
    Meier, Dennis
    Razumnaya, Anna
    Gregg, John Martin
    Gruverman, Alexei
    Vinokur, Valerii M.
    Luk'yanchuk, Igor
    ADVANCED MATERIALS, 2022, 34 (45)
  • [5] Enhanced electromechanical response of ferroelectrics due to charged domain walls
    Tomas Sluka
    Alexander K. Tagantsev
    Dragan Damjanovic
    Maxim Gureev
    Nava Setter
    Nature Communications, 3
  • [6] Enhanced electromechanical response of ferroelectrics due to charged domain walls
    Sluka, Tomas
    Tagantsev, Alexander K.
    Damjanovic, Dragan
    Gureev, Maxim
    Setter, Nava
    NATURE COMMUNICATIONS, 2012, 3
  • [7] Domain walls in ferroelectrics
    Mantri, Sukriti
    Daniels, John
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2021, 104 (04) : 1619 - 1632
  • [8] Light-driven motion of charged domain walls in isolated ferroelectrics
    Ordonez-Pimentel, Jonathan
    Venet, Michel
    Ochoa, Diego A.
    Rubio-Marcos, Fernando
    Fernandez, Jose F.
    Garcia, Jose E.
    PHYSICAL REVIEW B, 2022, 106 (22)
  • [9] Ion and mixed electron-ion screening of charged domain walls in ferroelectrics
    Sturman, B.
    Podivilov, E.
    EPL, 2018, 122 (06)
  • [10] Visible-Light-Control of Dielectric Permittivity in Ferroelectrics with Charged Domain Walls
    Ordonez-Pimentel, Jonathan
    Garcia, Jose E.
    da Silva Jr, Paulo S.
    Venet, Michel
    PHYSICAL REVIEW APPLIED, 2023, 19 (03)