Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering

被引：17

作者：

Krause, Matthias ^{[1
]}

Bedel, Laurent ^{[2
]}

Taupeau, Anthony ^{[2
]}

Kreissig, Ulrich ^{[1
]}

Munnik, Frans ^{[1
]}

Abrasonis, Gintautas ^{[1
]}

Kolitsch, Andreas ^{[1
]}

Radnoczi, Gyoergy ^{[3
]}

Czigany, Zsolt ^{[3
]}

Vanhulsel, Annick ^{[4
]}

机构：

[1] Forschungszentrum Dresden, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

[2] CEA Grenoble, DRT LITEN DTNM LTS, F-38054 Grenoble 9, France

[3] Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1121 Budapest XII, Hungary

[4] VITO Mat Technol, B-2400 Mol, Belgium

来源：

THIN SOLID FILMS | 2009年 / 518卷 / 01期

关键词：

BCxNy; Thin films; Hard coatings; Magnetron sputtering; Spectroscopy; Structural properties; Mechanical properties; B-C-N; CARBON NITRIDE FILMS; THERMAL-STABILITY; AMORPHOUS-CARBON; ELECTRONIC-PROPERTIES; RAMAN-SPECTROSCOPY; BORON-NITRIDE; COATINGS; CNX; INDENTATION;

D O I：

10.1016/j.tsf.2009.06.030

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

BCxNy thin films deposited at 250 degrees C by pulsed reactive magnetron sputtering of a B4C target in an Ar/N-2 plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6% to 100% N-2 in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp(2) carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N-2 concentration in the plasma and have significant influence on the Young's modulus and the elastic recovery of the BCxNy thin films. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：77 / 83

页数：7

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