Impurity Occurrence and Removal in Crystalline Products from Process Reactions

被引:27
|
作者
Moynihan, Humphrey K. [1 ]
Horgan, Danielle E. [1 ]
机构
[1] Univ Coll Cork, Dept Chem, Analyt & Biol Chem Res Facil, Synth & Solid State Pharmaceut Ctr, Cork, Ireland
基金
爱尔兰科学基金会;
关键词
SCALE SYNTHESIS; SOLID-SOLUTION; (R; R)-FORMOTEROL TARTRATE; NUCLEATION INHIBITION; GENOTOXIC IMPURITIES; L-ISOLEUCINE; ACID; INTERMEDIATE; RESOLUTION; PHENACETIN;
D O I
10.1021/acs.oprd.6b00403
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
The behavior of impurities when subjected to crystallizations, and related processes such as recrystallization and reslurrying, has been reviewed with a particular focus on the years 2000-2015, but also including significant cases from outside that period. Small molecule pharmaceuticals and similar small organic molecules are included but not biomolecules, inorganics, or minerals. Phase impurities are only covered when a phase transformation is involved with the management of an impurity. Introductory examples illustrating some general features of crystallization as a method of purification are presented, as well as approaches to quantifying the effectiveness of purification. The review classifies cases based on the behavior of the specific impurities covered. The classes of behavior observed are the removal by washing, recrystallization, or reslurrying (Class I), impurities not being removed by these operations (Class II), and impurities which are removed in conjunction with a phase transformation (Class III). Examples of each of these types of behavior are presented, with many processes producing impurities which fall into more than one of these classes. Studies on the inclusion of extraneous molecules into crystalline materials are also covered. These particularly include the incorporation of compounds as solid solutions, but also eutectic formation and inclusion at surfaces during crystal growth. The relationship between types of impurities and behavior during processing is also examined.
引用
收藏
页码:689 / 704
页数:16
相关论文
共 50 条
  • [1] Process development for impurity removal from a tin gravity concentrate
    Bulatovic, S
    De Silvio, E
    MINERALS ENGINEERING, 2000, 13 (8-9) : 871 - 879
  • [2] Removal of impurity ions from helical devices by a trapping/detrapping process
    Antufyev, OY
    Shishkin, AA
    FUSION SCIENCE AND TECHNOLOGY, 2004, 46 (02) : 312 - 317
  • [3] ELLIOTT OXGYEN PROCESS AND IMPURITY REMOVAL SYSTEM
    CRAWFORD, DB
    CHEMICAL ENGINEERING PROGRESS, 1950, 46 (02) : 74 - 78
  • [4] Innovative electroscrubbing process for biogas impurity removal
    Borgquist, Sebastian
    Villadsen, Sebastian Nis Bay
    Abildskov, Jens
    Warm, Christian
    Kristensen, Per Gravers
    Moos, Kristoffer
    Tinoco, Rodrigo Rivera
    Fosbol, Philip Loldrup
    SEPARATION AND PURIFICATION TECHNOLOGY, 2025, 354
  • [5] Removal and occurrence state transformation of Ti impurity in Gd metal
    Zhen-Fei Yang
    Si-Ming Pang
    Shi-Hong Yan
    Hong-Bo Yang
    Xiao-Wei Zhang
    Qiong Zhu
    De-Hong Chen
    Dao-Gao Wu
    Rare Metals, 2021, 40 (08) : 2320 - 2326
  • [6] Removal and occurrence state transformation of Ti impurity in Gd metal
    Zhen-Fei Yang
    Si-Ming Pang
    Shi-Hong Yan
    Hong-Bo Yang
    Xiao-Wei Zhang
    Qiong Zhu
    De-Hong Chen
    Dao-Gao Wu
    Rare Metals, 2021, 40 : 2320 - 2326
  • [7] Removal and occurrence state transformation of Ti impurity in Gd metal
    Yang, Zhen-Fei
    Pang, Si-Ming
    Yan, Shi-Hong
    Yang, Hong-Bo
    Zhang, Xiao-Wei
    Zhu, Qiong
    Chen, De-Hong
    Wu, Dao-Gao
    RARE METALS, 2021, 40 (08) : 2320 - 2326
  • [8] Modeling the process of impurity removal from semiconductor wafers in inhomogeneous temperature field
    Rudakov, VI
    Bashmakov, AV
    Ovcharov, VV
    TECHNICAL PHYSICS LETTERS, 2004, 30 (03) : 197 - 199
  • [9] Modeling the process of impurity removal from semiconductor wafers in inhomogeneous temperature field
    V. I. Rudakov
    A. V. Bashmakov
    V. V. Ovcharov
    Technical Physics Letters, 2004, 30 : 197 - 199
  • [10] Comments on "removal of impurity ions from helical devices by a trapping/detrapping process"
    Grekov, DL
    Stepanov, KN
    FUSION SCIENCE AND TECHNOLOGY, 2006, 49 (01) : 86 - 87