Late-News Poster: Optimized ODF Design rule for Mobile & Application TFT-Panel

被引：0
|
作者：
Lim, Junhwan [1 ]
Ko, Youngyik [1 ]
Hwang, Lyulyun [1 ]
Park, Seungyik [1 ]
Park, Jinsan [1 ]
Jung, Heechul [1 ]
Hwang, Soowoong [1 ]
机构：
[1] Chengdu BOE Optoelect Technol Co LTD, Ctr Res & Dev, Beijing 100016, Peoples R China
来源：
2009 SID INTERNATIONAL SYMPOSIUM DIGEST OF TECHNICAL PAPERS, VOL XL, BOOKS I - III | 2009年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Small sized TFT-panel such as mobile & application product have different mura phenomenon comparing large-sized TFT-panel in ODF(one drop filling) process. Unlike large-sized TFT-panel, for small sized TFT-panel, push mura and bubble is more serious than gravity mura because portable devices such as mobile & application are sensitive to external shocks. We have developed 1.8 '', 2.0 '' and 2.4 '' TFT-panel in ODF process. Through these TFT-panels, we have developed the PS(post spacer)design rule, process margin and method of material developments that reflect correlation with push mura, bubble and side mura. Through these rules, we suggest PS design rule, process rule and material development in order to optimize mobile & application ODF panel.
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页码：1355 / 1358
页数：4
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