Discharge instability induced by external laser preionization of a XeF discharge laser

被引：1
|
作者：
Takahashi, E. [1 ]
Kato, S. [1 ]
Matsumoto, Y. [1 ]
Okuda, I. [1 ]
机构：
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
来源：
APPLIED PHYSICS B-LASERS AND OPTICS | 2010年 / 98卷 / 2-3期
关键词：
EXCIMER-LASER; BEAM; IONIZATION; ATOMS;
D O I：
10.1007/s00340-009-3715-5
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
External-laser-induced preionization of excimer lasers was investigated. A discharge XeF laser was preionized by two different UV lasers [a KrF laser (lambda=249 nm) and an ArF laser (lambda=193 nm)], and the improvements in performance of the XeF laser were compared. The XeF laser beam profiles were measured by an intensified CCD (ICCD) camera with temporal resolution of 10 ns. Striated XeF laser profiles were obtained with 249 nm laser preionization, whereas there was no striation in the profiles for 193 nm laser preionization. These striations originated from discharge in the XeF laser induced by laser preionization. The influence of excited rare-gas atoms on the discharge instability was examined.
引用
收藏
页码：501 / 505
页数：5
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