Beam optics optimization of a negative-ion sputter source

被引：0
|
作者：
Osswald, F [1 ]
Rebmeister, R [1 ]
机构：
[1] ULP, CNRS, IN2P3, Inst Rech Subatom,UMR 7500, F-67037 Strasbourg 2, France
来源：
PRAMANA-JOURNAL OF PHYSICS | 2002年 / 59卷 / 05期
关键词：
negative-ion source; sputtering; beam optics;
D O I：
10.1007/s12043-002-0093-5
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
A negative-ion sputter source has been studied in order to increase the beam intensity delivered by the Vivitron tandem injector. The aim was to characterize the influence on the beam intensity of some factors related to the configuration of the source such as the shape of the target holder, the target surface topography and the anode/cathode voltage. The paper reports the results carried out by experimentation on a test facility and on the injector itself as well as the investigations performed with computer simulations.
引用
收藏
页码：795 / 804
页数：10
相关论文
共 50 条
  • [1] Beam optics optimization of a negative-ion sputter source
    F Osswald
    R Rebmeister
    Pramana, 2002, 59 : 795 - 804
  • [2] SIMPLE NEGATIVE-ION SPUTTER SOURCE
    CASKEY, GT
    DOUGLAS, RA
    RICHARDS, HT
    SMITH, HV
    NUCLEAR INSTRUMENTS & METHODS, 1978, 157 (01): : 1 - 7
  • [3] SIMPLE NEGATIVE-ION SPUTTER SOURCE
    CASKEY, GT
    DOUGLAS, RA
    RICHARDS, HT
    SMITH, HV
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (04): : 541 - 542
  • [4] BRIGHTNESS AND EMITTANCE OF NEGATIVE-ION BEAM EMITTED BY A MIDDLETON SPUTTER SOURCE
    DOUCAS, G
    HYDER, HRM
    NUCLEAR INSTRUMENTS & METHODS, 1974, 119 (03): : 413 - 421
  • [5] THE EFFECT OF THE SOURCE OPTICS AND THE TEMPERATURE OF THE SPUTTER SURFACE ON THE NEGATIVE-ION YIELD OF THE SPUTTER SOURCE MISS-4M
    MATTHES, H
    PFESTORF, W
    STEINERT, L
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1984, 220 (01): : 112 - 114
  • [6] PLASMA SPUTTER NEGATIVE-ION SOURCE WITH ECR DISCHARGE
    TAKAGI, A
    IKEGAMI, K
    MORI, Y
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (04): : 2669 - 2671
  • [7] THE NEGATIVE-ION SPUTTER SOURCE MISS-585
    MATTHES, H
    PFESTORF, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1986, 244 (1-2): : 155 - 157
  • [8] NEGATIVE-ION SPUTTER SOURCE FOR OPERATION IN A VANDEGRAAFF TERMINAL
    ALESSI, JG
    LAUGHLIN, W
    SALADIN, JX
    MCNAMEE, WL
    GAZARIK, SD
    NUCLEAR INSTRUMENTS & METHODS, 1977, 147 (02): : 305 - 312
  • [9] NEGATIVE-ION SPUTTER SOURCE FOR VANDEGRAAFF TERMINAL OPERATION
    ALESSI, JG
    SALADIN, JX
    LAUGHLIN, W
    BASTIDE, RP
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (08): : 988 - 988
  • [10] NEGATIVE-ION PRODUCTION PROBABILITY IN RF PLASMA SPUTTER-TYPE HEAVY NEGATIVE-ION SOURCE
    TSUJI, H
    ISHIKAWA, J
    KAWABATA, Y
    GOTOH, Y
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (05): : 1732 - 1736
12345