High breakdown voltage characteristics in normally-off 4H-SiC VJFET using TCAD Simulation

被引:0
|
作者
Khalid, Muhammad [1 ]
Riaz, Saira [2 ]
Grekov, Alexandrov E. [3 ]
Santi, Enrico [3 ]
Naseem, Shahzad [2 ]
机构
[1] NED Univ Engn & Technol, Dept Phys, Karachi 75270, Pakistan
[2] Univ Punjab, Sch Phys Sci, Ctr Excellence Solid State Phys, Microelect Div, Lahore 54590, Pakistan
[3] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
关键词
Breakdown voltage; channel width; electric field; impact ionization; temperature; VERTICAL-CHANNEL-JFETS; RELIABILITY;
D O I
10.1016/j.matpr.2015.11.065
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The high temperature dependent breakdown voltages in normally-off 4H-SiC VJFET are simulated using Sentaurus TCAD at different temperatures ranging from 27 to 500 degrees C. Temperature dependent breakdown voltages simulations reveal the decrement in breakdown voltages with increasing temperature, and device exhibits negative temperature coefficient. In addition, breakdown voltages are straight forwardly linked with associated parameters like impact ionization, which is strongly dependant on electric field. The improved breakdown voltage of 14 kV (drain leakage current 10(-8) A) indicates relatively high electric field of 2.2 MV/cm. In addition, its high breakdown capability and low leakage current with adjustable channel width make 4H-SiC VJFET a desirable device for high voltage power applications. (C) 2015 Published by Elsevier Ltd.
引用
收藏
页码:5436 / 5440
页数:5
相关论文
共 50 条
  • [1] A high performance 4H-SiC normally-off VJFET
    Zhao, JH
    Tone, K
    Sheng, K
    Li, X
    Alexandrov, P
    Fursin, L
    Weiner, M
    Burke, T
    IPEMC 2004: THE 4TH INTERNATIONAL POWER ELECTRONICS AND MOTION CONTROL CONFERENCE, VOLS 1-3, CONFERENCE PROCEEDINGS, 2004, : 342 - 346
  • [2] Breakdown Analysis of Normally-Off 4H-SiC Trenched and Implanted VJFET
    Munir, T.
    Fakhar-E-Alam, M.
    Abbas, F.
    Atif, M.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2014, 16 (11-12): : 1400 - 1404
  • [3] Breakdown analysis of normally-off 4H-SiC trenched and implanted VJFET
    Fakhar-E-Alam, M., 1600, National Institute of Optoelectronics (16): : 11 - 12
  • [4] Effect of channel width on breakdown Analysis of Normally-Off 4H-SiC Trenched and Implanted VJFET
    Munir, T.
    Abbas, F.
    Naseem, S.
    Raza, W.
    MATERIALS TODAY-PROCEEDINGS, 2015, 2 (10) : 5348 - 5351
  • [5] Switching performance of normally-off 4H-SiC TI-VJFET
    Munir, T.
    Raza, W.
    Naseem, S.
    Abbas, F.
    MATERIALS TODAY-PROCEEDINGS, 2015, 2 (10) : 5634 - 5637
  • [6] The Design of Normally-off 1300V 4H-SiC VJFET
    Chen, Gang
    Tao, Yonghong
    Bai, Song
    Liu, Ao
    Huang, Runhua
    Wang, Lin
    Li, Yun
    Zhao, Zhifei
    PROCEEDINGS OF THE 2015 6TH INTERNATIONAL CONFERENCE ON MANUFACTURING SCIENCE AND ENGINEERING, 2016, 32 : 1370 - 1373
  • [7] Design of a novel planar normally-off power VJFET in 4H-SiC
    Zhao, JH
    Li, X
    Tone, K
    Alexandrov, P
    Pan, M
    Weiner, M
    SOLID-STATE ELECTRONICS, 2003, 47 (02) : 377 - 384
  • [8] DC and switching performance of normally-off 4H-SiC TI-VJFET
    Munir, T.
    Fakhar-E-Alam, M.
    Raza, W.
    Abbas, Najeeb
    Atif, M.
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2014, 8 (11-12): : 1187 - 1190
  • [9] DC and switching performance of normally-off 4H-SiC TI-VJFET
    Munir, T., 1600, National Institute of Optoelectronics (08): : 11 - 12
  • [10] A novel high-voltage normally-off 4H-SiC vertical JFET
    Zhao, JH
    Li, X
    Tone, K
    Alexandrov, P
    Pan, M
    Weiner, M
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1223 - 1226