Effect of annealing on properties of electrochemically deposited CdTe thin films

被引:34
|
作者
Kokate, A. V. [1 ]
Asabe, M. R.
Hankare, P. P.
Chougule, B. K.
机构
[1] Shivaji Univ, Dept Phys, Kolhapur 416004, Maharashtra, India
[2] Shivaji Univ, Dept Chem, Kolhapur 416004, Maharashtra, India
关键词
thin films; CdTe; XRD (X-ray diffraction);
D O I
10.1016/j.jpcs.2006.09.018
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Thin films of CdTe have been deposited onto stainless steel and fluorine-doped tin oxide (FTO)-coated glass substrates from aqueous acidic bath using electrodeposition technique. The different preparative parameters, such as deposition time, bath temperature and pH of the bath have been optimized by photoelectrochemical (PEC) technique to get good quality photosensitive material. The deposited films are annealed at different temperature in presence of air. Annealing temperature is also optimized by PEC technique. The film annealed at 200 degrees C showed maximum photosensitivity. Different techniques have been used to characterize as deposited and also as annealed (at 200 degrees C) CdTe thin film. The X-ray diffraction (XRD) analysis showed the polycrystalline nature, and a significant increase in the XRD peak intensities is observed for the CdTe films after annealing. Optical absorption shows the presence of direct transition with band gap energy 1.64 eV and after annealing it decreases to 1.50 cV. Energy dispersive analysis by X-ray (EDAX) study for the as-deposited and annealed films showed nearly stoichiometric compound formation. Scanning electron microscopy (SEM) reveals that spherically shaped grains are more uniformly distributed over the surface of the substrate for the CdTe film. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:53 / 58
页数:6
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