Subwavelength grating structures with magnetic resonances at visible frequencies fabricated by nanoimprint lithography for large area applications

被引:3
|
作者
Kaplan, Alex F. [1 ]
Chen, Yi-Hao [1 ]
Kang, Myung-Gyu [1 ]
Guo, L. Jay [1 ]
Xu, Ting [2 ]
Luo, Xiangang [2 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
[2] Chinese Acad Sci, IOE, State Key Lab Opt Technol Microfabricat, Chengdu, Peoples R China
来源
关键词
dielectric materials; diffraction gratings; finite difference time-domain analysis; finite element analysis; light polarisation; magnetic resonance; magneto-optical effects; nanofabrication; nanolithography; optical fabrication; refractive index; silicon compounds; silver; visible spectra; NEGATIVE PERMEABILITY; REFRACTIVE-INDEX; METAMATERIALS; RESONATORS; FILMS;
D O I
10.1116/1.3243228
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Transmission of TM-polarized light through a subwavelength metal-dielectric grating structure exhibits strong resonance in the visible range. Simulations by finite-difference time-domain and finite-element methods show that the resonance can be attributed to the magnetic response. Further simulation shows that the grating structure can be optimized by adding an index matching dielectric layer to produce negative refractive index response in the visible band. Easily fabricated using nanoimprint lithography and conveniently able to be excited by incident light normal to the fabrication plane, such metal-dielectric grating structure could find potential use in large area negative refractive index applications.
引用
收藏
页码:3175 / 3179
页数:5
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