Morphology of Al2O3 Film Fabricated by Atomic Layer Deposition

被引：0

作者：

Wang Chenying ^{[1
]}

Yang Shuming ^{[1
]}

Li Changsheng ^{[1
]}

Jing Weixuan ^{[1
]}

Lin Qijing ^{[1
]}

Jiang Zhuangde ^{[1
]}

Zhang Yijun ^{[1
]}

机构：

[1] Xi An Jiao Tong Univ, Xian 710049, Peoples R China

来源：

RARE METAL MATERIALS AND ENGINEERING | 2015年 / 44卷 / 12期

关键词：

atomic layer deposition (ALD); Al2O3; multifractal;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The surface morphology characteristics of Al2O3 film with thickness less than 10 nm fabricated by atomic layer deposition (ALD) were studied and 4 nm and 8 nm thick Al2O3 thin films were obtained by ALD. The surface morphology of the film was measured by atomic force microscopy (AFM) and scanning electron microscopy (SEM). By the least squares method and multi-fractal, the surface morphology of film was studied. Results show that the film morphology has a correlation with the principle of generated films rather than the thickness.

引用

页码：3078 / 3082

页数：5

共 12 条

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