Effects of X-ray Irradiation on Vertical GaN-on-GaN Schottky Barrier Diode Biased on the Applied Voltage

被引:1
|
作者
Li, Xiao-Xi [1 ]
Chen, Jin-Xin [1 ]
Huang, Wei [1 ]
Ji, Zhigang [2 ]
Feng, Zhi-Hong [3 ]
Wu, Su-Zhen [4 ]
Xiao, Zhi-Qiang [1 ,4 ]
Lu, Hong-Liang [1 ]
机构
[1] Fudan Univ, State Key Lab ASIC & Syst, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, Shanghai 200433, Peoples R China
[2] Shanghai Jiao Tong Univ, Natl Key Lab Sci & Technol Micro Nano Fabricat, Shanghai 200240, Peoples R China
[3] Hebei Semicond Res Inst, Sci & Technol ASIC Lab, Shijiazhuang 050051, Hebei, Peoples R China
[4] Wuxi Microelect Sci & Res Ctr, Adv Proc & Integrat Lab, Wuxi 214072, Jiangsu, Peoples R China
基金
中国国家自然科学基金; 上海市自然科学基金;
关键词
GaN-on-GaN; SBD; X-ray; I-V; PROTON IRRADIATION; THIN-FILMS; DC;
D O I
10.1109/ipfa49335.2020.9261085
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The radiation characteristics of vertical GaN-on-GaN Schottky barrier diodes (SBD) by the bias of +0.8 V and -5.0 V have been investigated with four different doses of the total ionizing dose irradiation for the first time. The off-state current decreases by similar to 99 % for X-ray doses of 80 krad due to the trapping of electrons at the nitrogen vacancies and the barrier height increases. The off-state current for X-ray doses above 160 krad increases owing to the effects of X-ray radiation induced carrier generation over occupation of defect sites. The leakage current still reduces compared with that of the pristine device even after 400 krad X-ray doses. Moreover, the effect of X-ray irradiation on the physical characteristics has been analysed by X-ray diffraction (XRD), Micro-raman, and photoluminescence (PL) measurements. This study provides an evidence for improved performance of GaN SBD devices by using a certain dosage treatment of X-ray.
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页数:4
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