Radiation source dependence of device performance degradation for 4H-SiC MESFETs

被引:0
|
作者
Ohyama, H.
Takakura, K.
Uemura, K.
Shigaki, K.
Kudou, T.
Matsumoto, T.
Arai, M.
Kuboyama, S.
Kamezawa, C.
Simoen, E.
Claeys, C.
机构
[1] Kumamoto Natl Coll Technol, Kumamoto 8611102, Japan
[2] JAXA, Ibaraki 3058505, Japan
[3] IMEC, B-3001 Louvain, Belgium
[4] Katholieke Univ Leuven, EE Dept, B-3001 Louvain, Belgium
关键词
SiC-MESFET; radiation damage; induced deep levels; thermal annealing;
D O I
10.1016/j.spmi.2006.09.009
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The impact of radiation source dependence on the device performance degradation of 4H-SiC MESFETs (Metal Schottky Field Effect Transistors), which have been irradiated at room temperature with 2 MeV electrons and 20 MeV protons, is studied. No performance degradation is observed by 1 x 10(15) e/cm(2) and 5 x 10(11) p/cm(2), while a slight increase of the linear drain current together with a decrease of the threshold voltage are noticed above higher fluence. The damage coefficient for protons is about three orders of magnitude larger than that for electrons. The radiation source dependence of the device performance degradation is attributed to the difference of mass and the possibility of nuclear collision for the formation of lattice defects. Based on thermal annealing results of electron-irradiated MESFETs, it is found that the recovery of the drain current characteristics principally takes place from 100 degrees C, and that the drain current recovers to the pre-rad value after 200 degrees C annealing. On the other hand, capacitance and induced deep levels do not recover by 200 degrees C annealing. It is concluded that the degradation of the drain current is mainly sensitive to the radiation-induced decrease of the Schottky barrier height at the gate contact. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:632 / 637
页数:6
相关论文
共 50 条
  • [1] Performance comparison of 4H-SiC MESFETs
    Prasad, D. Anil
    Komaragiri, Rama
    2013 ANNUAL INTERNATIONAL CONFERENCE ON EMERGING RESEARCH AREAS & 2013 INTERNATIONAL CONFERENCE ON MICROELECTRONICS, COMMUNICATIONS & RENEWABLE ENERGY (AICERA/ICMICR), 2013,
  • [2] Neutron radiation effect on 4H-SiC MESFETs and SBDs
    张林
    张义门
    张玉明
    韩超
    半导体学报, 2010, 31 (11) : 29 - 32
  • [3] Neutron radiation effect on 4H-SiC MESFETs and SBDs
    Zhang Lin
    Zhang Yimen
    Zhang Yuming
    Han Chao
    JOURNAL OF SEMICONDUCTORS, 2010, 31 (11) : 1140061 - 1140064
  • [4] Numerical analysis on the 4H-SiC MESFETs with a source field plate
    Deng, Xiaochuan
    Zhang, Bo
    Li, Zhaoji
    Chen, Zhuangliang
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2007, 22 (07) : 701 - 704
  • [5] Surface control of 4H-SiC MESFETs
    Hilton, KP
    Uren, MJ
    Hayes, DG
    Johnson, HK
    Wilding, PJ
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1387 - 1390
  • [6] Fabrication and characterization of 4H-SiC MESFETs
    Ning, Jin
    Zhang, Yang
    Liu, Zhongli
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2007, 28 (SUPPL.): : 385 - 387
  • [7] Study of trapping phenomenon in 4H-SiC MESFETs: Dependence on substrate purity
    Sghaier, N
    Bluet, JM
    Souifi, A
    Guillot, G
    Morvan, E
    Brylinski, C
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (02) : 297 - 302
  • [8] High perfonnance 4H-SiC MESFETs with a source field plated structure
    Deng, Xiaochuan
    Zhang, Bo
    Li, Zhaoji
    Cheng, Zhuangliang
    2007 INTERNATIONAL WORKSHOP ON ELECTRON DEVICES AND SEMICONDUCTOR TECHNOLOGY, 2007, : 78 - +
  • [9] Effect of passivation on device stability and gate reverse characteristics on 4H-SiC MESFETs
    Kerlain, A
    Morvan, E
    Dua, C
    Caillas, N
    Brylinski, C
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 1177 - 1180
  • [10] Suppression of instabilities in 4H-SiC microwave MESFETs
    Hilton, KP
    Uren, MJ
    Hayes, DG
    Wilding, PJ
    Smith, BH
    8TH IEEE INTERNATIONAL SYMPOSIUM ON HIGH PERFORMANCE ELECTRON DEVICES FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS, 2000, : 67 - 70