Application of a stacked elastically bent perfect Si monochromator with identical and different crystallographic planes for single crystal and powder neutron diffractometry

被引:4
|
作者
Tanaka, I [1 ]
Ahmed, FU [1 ]
Niimura, N [1 ]
机构
[1] Japan Atom Energy Res Inst, Adv Sci Res Ctr, Tokai, Ibaraki 3191195, Japan
关键词
bent perfect monochromator; intensity gain; multi-wavelength;
D O I
10.1016/S0921-4526(00)00317-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In order to obtain more neutrons at the sample position, two Si(1 1 1) plates of W250 x H40 x T5 mm(3) were stacked and currently succeeded in increasing the flux at the sample position of BIX-III diffractometer with JRR-3M at JAERI, Japan by a factor of 1.6 compared to that of a single Si plate. To improve the data taking efficiency, preliminarily, a multi-wavelength monochromator system of stacked elastically bent perfect Si(1 1 1) and Si(2 2 0) crystals was employed to carry out diffraction experiments of Si powder and a relatively complex single crystal, piperidine cobaloxime. Two wavelengths, lambda(1) = 1.80 Angstrom for Si(2 2 0) and lambda(2) = 2.94 Angstrom for Si(1 1 1) were selected for this experiment. All reflections were collected by a neutron imaging plate detector, and the profiles were found to be symmetric and well defined Gaussians. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:295 / 298
页数:4
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