Improved pitting corrosion behaviour of electrodeposited nanocrystalline Ni-Cu alloys in 3.0 wt.% NaCl solution

被引:93
|
作者
Ghosh, S. K. [1 ]
Dey, G. K.
Dusane, R. O.
Grover, A. K.
机构
[1] Bhabha Atom Res Ctr, Mat Proc Div, Bombay 400085, Maharashtra, India
[2] Bhabha Atom Res Ctr, Div Mat Sci, Bombay 400085, Maharashtra, India
[3] Indian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, India
关键词
nanocrystalline; Ni-Cu alloy; pulse electrodeposition; corrosion; potentiodynamic polarisation;
D O I
10.1016/j.jallcom.2005.12.094
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Nanocrystalline (nc) Ni-Cu alloys have been electrodeposited by using pulse current (PC) as well as direct current (dc) electrolysis. X-ray diffraction (XRD) and transmission electron microscopy (TEM) were employed to characterise the deposits. High-resolution electron microscopic (HREM) examination revealed that deposited nc alloys were dense in nature. Corrosion behaviour of both nc as well as Monel-400 were compared in 3.0 wt.% NaCl solution and was found that corrosion current density (i(corr)) of nc alloys were superior to Monel-400. Both optical as well as scanning electron microscopic (SEM) examination of the corroded surface revealed a well-defined pitting type of attack for Monet-400 unlike nc alloys; akin to homogeneous corrosion. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:235 / 243
页数:9
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