Study on the structure and electrochromism of WO3 and Ti-doped WO3 films

被引:2
|
作者
Wang Lige [1 ]
Li Guoqing [1 ]
Hu Yuanrong [1 ]
Gou Wei [1 ]
Shi Meng [1 ]
机构
[1] Dalian Univ Technol, State Key Lab Mat Modificat Laser Elect & Ion Bea, Dalian 116024, Peoples R China
来源
SURFACE ENGINEERING (ICSE 2007) | 2008年 / 373-374卷
关键词
magnetron sputtering; electrochromic; WO3; films; Ti-doped WO3;
D O I
10.4028/www.scientific.net/KEM.373-374.726
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
WO3 and Ti-doped WO3 electrochromic films were prepared by mid-frequency dual-target magnetron sputtering method. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transmission electron microscope (TEM) and spectrophotometer were used to characterize the structure, morphology, composition and transmittance properties of the films, respectively. The results show that this method is available to deposit WO3 and Ti-doped WO3 electrochromic films. The as-deposited films prepared at room temperature are amorphous and display good transmittance. The difference value of transmittance between the bleached and coloration states Of WO3 film is above 60% at 633nm. Ti-doped WO3 films have smoother surface and smaller grains than undoped ones. Moreover, the crystalline temperature increases after doping titanium, because the titanium atoms influence the lattice distortion of the WO3 films. So it is more convenient for Li+ ions to inject into films and can enhance the response speed and stability of Ti-doped WO3 electrochromic films.
引用
收藏
页码:726 / 729
页数:4
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