The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

被引：7
|
作者：
Azibi, Mourad [1 ,2 ]
Saoula, Nadia [1 ]
Aknouche, Hamid [2 ]
机构：
[1] CDTA, HaouchOukil Cite 20 Aout 1956 Baba Hassen, Algiers 16303, Algeria
[2] Univ Mhamed Bougara, Fac Sci Ingn Cite Frantz Fanon, Unite Rech Mat Proc & Environm, Boumerdes, Algeria
来源：
JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS | 2019年 / 70卷 / 07期
关键词：
ZrN; 316L stainless steel; RF magnetron sputtering; bias voltage; corrosion; DIFFUSION; COATINGS; CONTACT; COLOR;
D O I：
10.2478/jee-2019-0051
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-requency (rf) magnetron sputtering from a pure zirconium target in Ar - N-2 gas mixture. The substrate bias voltage was varied from 0 to -100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.
引用
收藏
页码：112 / 116
页数：5
相关论文
共 50 条
  • [1] Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering
    Saoula, N.
    Madaoui, N.
    Tadjine, R.
    Erasmus, R. M.
    Shrivastava, S.
    Comins, J. D.
    [J]. THIN SOLID FILMS, 2016, 616 : 521 - 529
  • [2] Iridium thin films deposited by radio-frequency magnetron sputtering
    El Khakani, MA
    Chaker, M
    Le Drogoff, B
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (02): : 885 - 888
  • [3] Effect of Substrate Bias Voltage on the Physical Properties of Zirconium Nitride (ZrN) Films Deposited by Mid Frequency Reactive Magnetron Sputtering
    Kavitha, A.
    Kannan, R.
    Loganathan, S.
    [J]. INTERNATIONAL JOURNAL OF NANOSCIENCE, 2014, 13 (02)
  • [4] Gallium nitride thin films deposited by radio-frequency magnetron sputtering
    Maruyama, Toshiro
    Miyake, Hidetomo
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (04): : 1096 - 1099
  • [5] Influence of substrate bias voltage on the properties of TiO2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications
    Bait, L.
    Azzouz, L.
    Madaoui, N.
    Saoula, N.
    [J]. APPLIED SURFACE SCIENCE, 2017, 395 : 72 - 77
  • [6] PHYSICOCHEMICAL PROPERTIES IN TUNGSTEN FILMS DEPOSITED BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    COLLOT, P
    AGIUS, B
    ESTRACHE, P
    HUGON, MC
    FROMENT, M
    BESSOT, J
    CRASSIN, Y
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2319 - 2325
  • [7] Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering
    Lv, Yanhong
    Ji, Li
    Liu, Xiaohong
    Li, Hongxuan
    Zhou, Huidi
    Chen, Jianmin
    [J]. APPLIED SURFACE SCIENCE, 2012, 258 (08) : 3864 - 3870
  • [8] CHARACTERIZATION OF SILVER FILMS DEPOSITED BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    MARECHAL, N
    QUESNEL, E
    PAULEAU, Y
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (03): : 707 - 713
  • [9] Influence of substrate direct current bias voltage on microcrystalline silicon growth during radio-frequency magnetron sputtering
    Tabata, A.
    Fukaya, K.
    Mizutani, T.
    [J]. VACUUM, 2008, 82 (08) : 777 - 781
  • [10] Optical properties of hexagonal boron nitride thin films deposited by radio frequency bias magnetron sputtering
    Deng Jin-Xiang
    Zhang Xiao-Kang
    Yao Qian
    Wang Xu-Yang
    Chen Guang-Hua
    He De-Yan
    [J]. CHINESE PHYSICS B, 2009, 18 (09) : 4013 - 4018
12345