Dielectric property of LaAlO3 thin films doped with magnetic Co and Co3O4 clusters

被引:0
|
作者
Jiang, H [1 ]
Liu, HW [1 ]
Yu, H [1 ]
Gao, F [1 ]
Liu, JM [1 ]
机构
[1] Nanjing Univ, Nanjing Natl Lab Microstruct, Nanjing 210093, Peoples R China
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2005年 / 19卷 / 15-17期
关键词
dielectric capacitance; magnetism; nanoparticle;
D O I
10.1142/S0217979205031511
中图分类号
O59 [应用物理学];
学科分类号
摘要
sThe thin films of Co-doped and Co3O4-doped dielectric LaAlO3 (LAO) by co-ablation of magnetic metal Co and dielectric LAO on Pt - Ti - SiO2 - Si substrates have been prepared by pulsed laser deposition. A significant enhancement of dielectric constant of LAO upon doping of Co and cobalt oxide clusters is observed. Furthermore, modulation of the dielectric constant of the thin films by applying a magnetic field is verified, obviously due to the ferromagnetism of Co metal and Co oxide clusters embedded in the LAO thin films. A series of microstructural and dielectric characterizations on the as-prepared thin films have been performed and the mechanism underlying the dielectric enhancement upon the doping of Co and Co3O4 clusters is discussed.
引用
收藏
页码:2676 / 2681
页数:6
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