Performances comparison of Si and GaAs based resonant tunneling diodes

被引:2
|
作者
Buccafurri, Emanuela [1 ]
Clerc, Raphael [2 ]
Calmon, Francis [1 ]
Pala, Marco [2 ]
Poncet, Alain [1 ]
Ghibaudo, Gerard [2 ]
机构
[1] INSA Lyon, INL, 7 Av Jean Capelle, F-69621 Villeurbanne, France
[2] IMEP, LAHC, F-38016 Grenoble, France
关键词
D O I
10.1002/pssc.200881525
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
On the basis of an original, physically based analytical model, I-V characteristic of the resonant tunneling diode structure (RTD) has been studied. Comparing AlAs/GaAs heterostructure RTD and Si-based RTD of same dimensions, it turns out that the performances of GaAs devices are superior. However, similar performances can be achieved in the Hf0(2)/Si RTD, by a strong reduction in barrier runnel thickness and width well. In conclusion, an extreme shrinking of Hf0(2)/Si structure dimensions can offer, in principle, RTD performances comparable to conventional AlAs/GaAs heterostructures. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1408 / +
页数:2
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