Atomic layer deposition for nanostructured Li-ion batteries

被引:100
|
作者
Knoops, H. C. M. [1 ]
Donders, M. E. [1 ,2 ]
van de Sanden, M. C. M. [1 ]
Notten, P. H. L. [1 ]
Kessels, W. M. M. [1 ]
机构
[1] Eindhoven Univ Technol, NL-5600 MB Eindhoven, Netherlands
[2] Mat Innovat Inst M2i, NL-2600 GA Delft, Netherlands
来源
关键词
REMOTE PLASMA ALD; THIN-FILM; ELECTRODE MATERIALS; SURFACE-CHEMISTRY; LITHIUM BATTERIES; ANODE MATERIALS; CHALLENGES; TIN; INTERCALATION; CONVERSION;
D O I
10.1116/1.3660699
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanostructuring is targeted as a solution to achieve the improvements required for implementing Li-ion batteries in a wide range of applications. These applications range in size from electrical vehicles down to microsystems. Atomic layer deposition (ALD) could be an enabling technology for nanostructured Li-ion batteries as it is capable of depositing ultrathin films (1-100 nm) in complex structures with precise growth control. The potential of ALD is reviewed for three battery concepts that can be distinguished, i.e., particle-based electrodes, 3D-structured electrodes, and 3D all-solid-state microbatteries. It is discussed that a large range of materials can be deposited by ALD and recent demonstrations of battery improvements by ALD are used to exemplify its large potential. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3660699]
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页数:10
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